TN304.21 TN305.3
国家自然科学基金(69976019)和山东省自然科学基金(Y99G01)资助
裴素华 修显武 等. P型杂质Ga在SiO2—Si内界面分凝规律研究[J]. 科学技术与工程, 2003, (1): 71-74.
PEI Suhua, XIU Xianwu, SUN Haibo, et al. Investigation of the Segregation Rule of P-type Dopant Ga at SiO2/Si Interface[J]. Science Technology and Engineering,2003,(1):71-74.