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吕红阳,陈立国,仲丁元,等. 基于双显微视觉的光刻版位姿定位算法[J]. 科学技术与工程, 2020, 20(32): 13295-13301.
LV Hong-yang,ZHONG Ding-yuan,et al.Research on Positioning Algorithm of Lithographic mask posture Based on Binocular Micro-vision[J].Science Technology and Engineering,2020,20(32):13295-13301.
基于双显微视觉的光刻版位姿定位算法
Research on Positioning Algorithm of Lithographic mask posture Based on Binocular Micro-vision
投稿时间:2020-03-17  修订日期:2020-07-28
DOI:
中文关键词:  视觉对位  亚像素边缘检测  RANSAC算法  位姿检测
英文关键词:Visual alignment  Sub-pixel edge detection  RANSAC algorithm  Posture detection
基金项目:江苏省高校自然科学研究项目(项目编号:17KJA460008)
           
作者单位
吕红阳 苏州大学机电工程学院
陈立国 苏州大学机电工程学院
仲丁元 苏州大学机电工程学院
薛立伟 苏州大学机电工程学院
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中文摘要:
      光刻版工件移动位姿的精确定位及调整是完成其视觉对位的关键。本文针对光刻版工件跨尺度级高精度对位的难点,搭建了双显微视觉对位系统,通过双显微视觉的局部位姿检测,解决了工件尺寸与定位精度之间的矛盾。具体方法为:首先采用双显微视觉获取工件两端局部图像;接着提出改进Canny算法并基于多项式插值的边缘细分完成亚像素级边缘轮廓提取;然后基于RANSAC算法拟合边缘轮廓,获得左右相机图像中“Mark”标志中心点位置坐标及偏转角度;最后通过推导局部位姿间数学关系完成光刻版工件的精确位姿定位。实验结果表明:所设计的视觉算法对于0.5 mm平行线的距离检测精度达1.93 μm、角度提取精度达0.018°;对于光刻版的移动位姿的定位精度达0.64 μm,能满足视觉对位过程中高速高精度的定位需求。
英文摘要:
      Precisely positioning and adjustmenting posture of the lithographic masks which is in the stage of moving is the key to successfully complete visual alignment. According to the difficulty of cross-scale high-precision alignment of lithographic mask, a binocular micro-vision alignment system was built. The contradiction between the masks size and positioning accuracy was resolved by detecting partial pose. The specific method was shown as follows. Firstly, the partial images at the ends of the mask were obtained by double micro-vision. Then, the sub-pixel edge profile extraction was completed based an improved Canny algorithm and polynomial interpolation subdivision. Next, the edge profile was fitted based on the RANSAC algorithm to obtain the center point position and deflection angle of the mask in the left and right camera images. Finally, the precise posture of the lithographic mask can be achieved by deducing the mathematical relationship between the partial pose. The experimental results show that for 0.5 mm parallel lines the distance accuracy of designed vision algorithm was 1.93 μm and the angle accuracy was 0.018°; The positioning accuracy of the lithographic mask"s moving posture can reach 0.64 μm, and the high-speed and high-precision positioning requirements in the process of visual alignment can be realized.
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